The wafer vacuum annealing furnace is mainly used for low-temperature annealing of semiconductor wafers.
Size: 4-8 inch wafer
Wafer Boat: Standard
Temperature control accuracy: ± 3 ℃
Heating rate: 10 ℃/min
Cleanliness level: Class 1000 cleanliness
Wafer vacuum annealing furnace
Launch Time：2024-07-16
View Count：43
Product Type：退火炉
Product Color：
Product Price：￥
Product Info
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